AI Thermal Stack Map (junction-to-ambient)

Cross-cuts: Manufacturing
last updated 2026-06-22
TIM Approach Map (every thermal-interface-material class, in-market + R&D)TIM Approach Map (e…Thermal Interface Materials (TIM)Thermal Interface M…Diamond Heat SpreaderDiamond Heat Spread…Graphene Thermal FilmsGraphene Thermal Fi…Vapor ChambersVapor ChambersHeat PipesHeat PipesPhase-Change Materials (Thermal)Phase-Change Materi…Liquid Cooling at Datacentre ScaleLiquid Cooling at D…Advanced PackagingAdvanced PackagingAI Therma…

Why this map exists — the comparison logic

Heat leaves an AI accelerator along a path, junction → ambient, through a stack of layers. Each layer is a distinct engineering problem with its own physics, its own competing approaches, and its own value-capture answer. The single most useful discipline:

The meta-thesis over the whole map is Thermal Stack Arms Race: the stack stays segmented — no single material or layer wins all of it. This page is the substrate that thesis reasons over; the demand-side spine is Ai Power Thermal Binding and the buy-side market is Datacentre Thermal Power Market.

The stack, layer by layer

Heat flux at the hotspot now exceeds ~1 kW/cm²; package TDP is passing 1 kW and heading to 1.8–2.3 kW (Nvidia Rubin, CES Jan 2026). Each layer below is where some of that heat is conducted, acquired, transported, or rejected.

Off-ladder — the power-converter plane (added 2 Sep 2026)

L0-L8 is one path: the accelerator’s own junction to ambient. An AI assembly has a second heat source that does not sit on it. The 48V-to-sub-1V conversion plane is mounted beneath the package, on the far side of the die from the cold plate, dissipating 3-4kW in one plane on a ~23kW part with 2mm or less of height for switches, magnetics and any thermal solution combined. It has its own junction-to-ambient path and that path terminates nowhere.

Consequence for anyone reading this map as a coverage check: a layer can be fully covered here and the assembly still be thermally bound, which is what a Cerebras architect reported in Aug 2026 (cooling the wafer is easy, cooling the converters is very difficult). Bet page: Converter Plane Thermal. Evidence: ref.

L0 — In-die / embedded cooling (the frontier that bypasses the TIM problem)

L3 — TIM2 (lid/spreader → cold plate)

L4 — Heat acquisition (cold plate / direct-to-chip)

L5 — Coolant / dielectric working fluid

L6 — Distribution (CDU, manifolds, plumbing)

L7 — Heat rejection (system → ambient) / immersion

Company placement table

The cohort, placed. L# = primary layer (secondary in parens). Status from the company page decision:. Garbled/duplicate auto-map slugs and demand-side (server OEMs, power devices) dropped — see the source note for the full raw classification.

Coverage read: thickest = L3 (commodity TIM2 incumbents, ~16) and L1 (the frontier, ~12). Thinnest = L0 (Corintis ~the only true entry), L5 (one real fluid line + dielectric secondaries), L8 (2–3). The thin layers are where either a genuine wedge (L0) or a dislocation (L5 PFAS) sits — built out as In Chip Microfluidic Cooling and Dielectric Coolant Pfas Transition.

Where the genuine early-stage venture wedge is (vehicle-agnostic, ranked by where value is held)

Frontier

See frontmatter frontier: block.

Reading list

Recent mentions

Related concepts

Frontier questions