Aluminium Scandium Nitride

last updated 2026-05-04

Physics / mechanism

AlScN is a wurtzite-structure piezoelectric and ferroelectric thin film formed by substituting Sc onto Al sites in AlN. Scandium doping (typically 20–43 at% Sc) dramatically increases the piezoelectric coefficient (e₃₃) from ~1.5 C/m² in pure AlN to >4 C/m² at ~40% Sc, and enables ferroelectric switching absent in AlN. Electromechanical coupling (kt²) reaches 10–20%, versus 6–7% for AlN. Bulk acoustic resonator (BAR/FBAR) devices using AlScN now target frequencies from 3–30 GHz with Q-factors >1000. CMOS-compatible deposition via reactive co-sputtering is established; uniformity and phase-purity at high Sc concentrations remain active engineering problems. Ferroelectric memory (FeMEM) and neuromorphic applications are emerging, with coercive fields ~5 MV/cm.

Competitive landscape

AlScN competes primarily with PZT, LiNbO₃, and pure AlN in piezo/ferroelectric applications. GaN-on-Si and BaTiO₃ are adjacent in RF and memory respectively.

Materialkt²CMOS compat.Ferroelectric
AlN~7%YesNo
AlScN10–20%YesYes (>30% Sc)
PZT25–35%No (Pb)Yes

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